Publications [#60214] of Peter K. Haff
- Haff, P. K. and Switkowski, Z. E., ION-BEAM-INDUCED ATOMIC MIXING.,
Journal of Applied Physics, vol. 48 no. 8
pp. 3383 - 3386 [1.324179]
(last updated on 2007/04/10)
The increasing use of ion-probe microanalysis to study elemental profiles near surfaces has led to detailed considerations of the effects of the ion bombardment on the initial distributions. Calculations based on the diffusion model are presented of atomic mixing by ion bombardment. This mixing is assumed to have its basis, as does sputtering, in the collision cascades generated by the primary beam. Sharp interfaces within a target are seen to be smoothed by ion bombardment. Mixing may place fundamental limits on the resolution of ion microprobes.