Papers Published
Abstract:
The paper reports the successful attempts at significantly improving the electron mobility in thin channel, device structures with high two-dimensional electron gas (2DEG) concentrations. InGaAs-AlInAs modulation-doped structures were grown by MBE in a Riber 2300 system on (100)-oriented InP substrates. The highest room temperature mobility achieved to date for low sheet charge and high sheet charge samples were realized in a structure with a 10nm 80% In channel utilizing a stress-compensation prelayer.
Keywords:
Semiconducting indium compounds;Semiconductor growth;Electron transport properties;Semiconductor device structures;Molecular beam epitaxy;Semiconductor doping;Phase transitions;Crystal lattices;Gates (transistor);Relaxation processes;Electron transitions;High temperature operations;