Papers Published

  1. Dimmey, L.J. and Jones, P.L. and Cocks, F.H., Magnetic field enhancement of amorphous silicon deposition rates, Thin Solid Films (Switzerland), vol. 67 no. 1 (1980), pp. 13 - 15 [0040-6090(80)90281-3] .
    (last updated on 2007/04/10)

    Abstract:
    The effect of an applied magnetic field on the deposition rate of an amorphous silicon thin film, prepared by the glow discharge decomposition of silane, is investigated

    Keywords:
    amorphous semiconductors;elemental semiconductors;magnetic field effects;plasma deposition;semiconductor thin films;silicon;