Papers Published

  1. Chilkoti, A. and Frey, W., Ultraflat nanosphere lithography: a new method to fabricate flat nanostructures, Proceedings of the euspen. 2nd International Conference, vol. vol.1 (2001), pp. 200 - 3 .
    (last updated on 2007/04/12)

    We report a new nanofabrication technique, ultraflat nanosphere lithography (UNSL), in which we have combined two existing methods, nanosphere lithography (NSL) and ultraflat template stripping, to create ultraflat nanopatterned surfaces. In UNSL, a material is deposited onto mica though a mask created by a close-packed monolayer of nanospheres, and, after removal of the spheres, a second material is deposited on the nanostructures. Subsequently, upon removing the mica, the surface in contact with the mica reveals flat nanostructures of the first material embedded in a matrix of the second deposited material