Papers Published

  1. Frey, W. and Woods, C.K. and Chilkoti, A., Ultraflat nanosphere lithography: a new method to fabricate flat nanostructures, Adv. Mater. (Germany), vol. 12 no. 20 (2000), pp. 1515 - 19 [1521-4095(200010)12:20<1515::AID-ADMA1515>3.0.CO;2-J] .
    (last updated on 2007/04/12)

    Ultraflat nanopatterned surfaces can be created by combining the techniques of nanosphere lithography and ultraflat template stripping, as highlighted here. In this new method-ultraflat nanosphere lithography (UNSL)-nanostructures of one material are embedded in a matrix of a second material. The feasibility of UNSL is demonstrated for several pairs of materials

    atomic force microscopy;lithography;nanostructured materials;nanotechnology;polymer structure;surface topography;