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Papers Published

  1. Yellen, B.B. and Fridman, G. and Friedman, G., Ferrofluid lithography, Nanotechnology, vol. 15 no. 10 (2004), pp. 562-565 - [011] .
    (last updated on 2007/04/06)

    A novel self-aligned 'soft masking' method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultrafine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic field bias applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV or chemical exposure.

    Iron oxides;Ferromagnetic materials;Ultraviolet radiation;Photoresists;Colloids;Evaporation;Optical interconnects;Substrates;