Papers Published

  1. Liu, J. and Zhirnov, V.V. and Wojak, G.J. and Myers, A.F. and Choi, W.B. and Hren, J.J. and Wolter, S.D. and McClure, M.T. and Stoner, B.R. and Glass, J.T., Electron emission from diamond coated silicon field emitters, Appl. Phys. Lett. (USA), vol. 65 no. 22 (1994), pp. 2842 - 4 [1.112538] .
    (last updated on 2007/04/17)

    Abstract:
    Polycrystalline diamond thin films have been formed on single crystal silicon field emitters using bias-enhanced nucleation in a microwave plasma chemical vapor deposition system. A diamond nucleation density greater than 1010/cm2 with small grain sizes (<25 nm) was achieved on the surfaces of silicon emitters with nanometer scale curvature. Field emission from these diamond coated silicon emitters exhibited significant enhancement compared to the pure Si emitters both in total emission current and stability. Using a Fowler-Nordheim analysis a very large effective emitting area of nearly 10-11 cm2 was obtained from the diamond coated Si emitters compared to that of uncoated Si emitters (10-16 cm2). This area was found to be comparable to the entire tip surface area

    Keywords:
    diamond;electron field emission;elemental semiconductors;plasma CVD coatings;semiconductor thin films;silicon;