Papers Published

  1. Tan, T.Y. and Foll, H. and Hu, S.M., On the diamond-cubic to hexagonal phase transformation in silicon, Philos. Mag. A, Phys. Condens. Matter Defects Mech. Prop. (UK), vol. 44 no. 1 (1981), pp. 127 - 40 .
    (last updated on 2007/04/10)

    An analysis of electron diffraction data from silicon wafers implanted with 80 keV As+ at high dose rates has shown the presence of a hexagonal phase of Si (a one-element wurtzite structure). The hexagonal silicon consists of small rod-like particles with an orientation relationship to the diamond-cubic (d.c.) silicon lattice given approximately by ⟨0001⟩hex∥⟨110⟩d.c. and ⟨0110⟩hex∥⟨001⟩d.c. This hexagonal silicon may also be produced by indenting the wafer surfaces at about 500 to 600°C (Eremenko and Nikitenko, 1972) which produces large platelets with 115d.c. habit planes. A phase transformation scheme is proposed for the silicon d.c. to hexagonal transformation. It is argued that the transformation may be induced by a uniaxial compressive stress and therefore represents a stress-relief mechanism. A structure model of the d.c.-hexagonal interface is proposed which consists of five- to seven-membered atomic rings without dangling bonds

    electron diffraction examination of materials;elemental semiconductors;ion implantation;polymorphic transformations;silicon;