Papers Published

  1. Ho, P.S. and Tan, T.Y., Submicron mask alignment by coherent light sources, IBM Tech. Discl. Bull. (USA), vol. 23 no. 1 (1980), pp. 360 - 1 .
    (last updated on 2007/04/10)

    Abstract:
    A method of fabricating integrated circuits is disclosed based on the use of interference or diffraction patterns produced by coherent light sources which can be used for accurate alignment of multi-level masks. The principle of this method consists of two steps: the production of the interference pattern and the recognition of the interference pattern

    Keywords:
    integrated circuit technology;laser beam applications;light interference;masks;