- Ho, P.S. and Tan, T.Y., Submicron mask alignment by coherent light sources,
IBM Tech. Discl. Bull. (USA), vol. 23 no. 1
pp. 360 - 1 .
(last updated on 2007/04/10)
A method of fabricating integrated circuits is disclosed based on the use of interference or diffraction patterns produced by coherent light sources which can be used for accurate alignment of multi-level masks. The principle of this method consists of two steps: the production of the interference pattern and the recognition of the interference pattern
integrated circuit technology;laser beam applications;light interference;masks;