Papers Published

  1. Foell, H. and Tan, T.Y. and Krakow, W., Undissociated dislocations and intermediate defects in As+ ion damaged silicon, Defects in Semiconductors. Proceedings of the Materials Research Society Annual Meeting (1981), pp. 173 - 7 .
    (last updated on 2007/04/10)

    Abstract:
    Undissociated dislocation dipoles and intermediate defects are detected in As+ ion damaged Si using the lattice resolution technique of transmission electron microscopy. The present results are consistent with the authors' dislocation nucleation models

    Keywords:
    arsenic;dislocation dipoles;dislocation nucleation;elemental semiconductors;ion implantation;silicon;transmission electron microscope examination of materials;