Papers Published

  1. Tan, T.Y. and Bell, W.L. and Thomas, G., Crystal thickness dependence of Kikuchi line spacing, Philos. Mag. (UK), vol. 24 no. 188 (1971), pp. 417 - 24 .
    (last updated on 2007/04/10)

    Abstract:
    Contrary to a common assumption that the Kikuchi line spacing should be the same as that of the corresponding Bragg spot pattern if diffraction geometry is properly considered, experimental results obtained by using high-purity silicon single crystal specimens at 100 kv show that the Kikuchi line spacing can be different from that of the corresponding Bragg spot pattern, depending on the specimen thickness. This result is explained on the basis of dynamical scattering of Kikuchi electrons

    Keywords:
    electron diffraction crystallography;electron diffraction examination of materials;silicon;