Papers Published

  1. Tan, T.Y. and Tice, W.K., Oxygen precipitation and the generation of dislocations in silicon, Philos. Mag. (UK), vol. 34 no. 4 (1976), pp. 615 - 31 .
    (last updated on 2007/04/10)

    Abstract:
    Oxygen-rich precipitates in silicon, and the generation of dislocations at the interfaces between the precipitates and the matrix were observed. The precipitates are square-shaped plates with ⟨110⟩ sides and 100 habit planes. Prismatic dislocation loops are generated in silicon by the mechanism of prismatic punching. The loops are identified as interstitial loops with 1/2 ⟨110⟩ Burgers vectors and ⟨110⟩ axis. An ideal loop is rhombus-shaped with line senses in ⟨112⟩ directions. Nucleation of loops follows the mechanism of Ashby and Johnson (1969): a shear loop is nucleated on an initial slip plane and completes a rhombus-shaped prismatic loop by repeated cross-slips. The loop nucleation process is identified, probably for the first time, for a system completely under internal stress

    Keywords:
    dislocations;elemental semiconductors;oxygen;precipitation;semiconductor defects;silicon;