Papers Published
Abstract:
A new 'top-down/bottom-up' approach for fabricating patterned polymer-brush arrays on the micrometer and nanometer length scales was reported. It was suggested that patterns with well-defined feature dimensions, shapes, and inter-feature spacings can be easily created over large areas by lift-off electron beam lithography (EBL). The utility of combining lift-off EBL for fabrication of Au patterns and surface-initiated polymerization to form micro- and nanostructures of stimulus-responsive polymer brushes on silicon surfaces was demonstrated. The fabrication approach was found to allow a high level of lateral control in patterning surfaces with complex polymer-brush structures over large surface area.
Keywords:
Nanostructured materials;Gold;Methanol;Monomers;Self assembly;Ellipsometry;Fourier transform infrared spectroscopy;Photolithography;Electron beam lithography;Scanning electron microscopy;
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