Papers Published
Abstract:
The fabrication of patterned polymeric nanostructures enables the development of miniaturized sensing and diagnostic applications. The atomic force microscopy (AFM) anodization, a form of field-induces scanning probe lithography (FISPL) offers a powerful means to nanopattern semiconductor surfaces with silicon oxide features that can be used for subsequent modification with Ru-based metathesis catalysts. A prototypical method is developed to fabricate nanopatterned polymers structures by combining AFM anodization lithography on silicon substrates with surface-initiated ROMP. EFM phase imaging was used to characterize the electronic state of the resulting nanopatterned polymer structures. Nanopatterns of two chemically different polymers were fabricated on a single substrate by a step-and-repeat patterning and polymerization approach. This process provides a universal platform for surface-initiated polymerization and means to fabricate complex polymeric structures.
Keywords:
Nanostructured materials;Polymers;Ring opening polymerization;Atomic force microscopy;Anodic oxidation;Catalysts;
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