Papers Published

1. Sampson, R.K. and Conrad, K.A. and Massoud, H.Z. and Irene, E.A., Wavelength considerations for improved silicon wafer temperature measurement by ellipsometry, J. Electrochem. Soc. (USA), vol. 141 no. 2 (1994), pp. 539 - 42 .
   (last updated on 2007/04/15)

   Abstract:
   The influence of the choice of wavelength on the resolution of silicon wafer temperature measurement by ellipsometry has been investigated. By changing the wavelength from 6328 to 4428 Å, a 30% reduction was achieved in the rms difference between the temperature measured by ellipsometry and that measured by a thermocouple. Additional optical data are presented which provide insight into selecting the optimum wavelength for silicon wafer temperature measurement by ellipsometry

   Keywords:
   elemental semiconductors;ellipsometry;silicon;spectral methods of temperature measurement;