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| Publications [#66831] of Adrienne D. Stiff-Roberts
Papers Published
- Stewart, K. and Buda, M. and Wong-Leung, J. and Fu, L. and Jagadish, C. and Stiff-Roberts, A. and Bhattacharya, P., Influence of rapid thermal annealing on a 30 stack InAs/GaAs quantum dot infrared photodetector,
Journal of Applied Physics, vol. 94 no. 8
(2003),
pp. 5283 - 5289 [1.1609634]
(last updated on 2007/04/16)
Abstract: Influence of rapid thermal annealing on a 30 stack InAs/GaAs quantum dot infrared photodetector (QDIP) was studied. Temperatures in the range of 600-800°C for 60 s, typical of atomic interdiffusion were used. The devices exhibited large dark currents after rapid thermal annealing.
Keywords: Semiconductor quantum dots;Semiconducting indium compounds;Semiconducting gallium arsenide;Rapid thermal annealing;Interdiffusion (solids);Electric currents;Semiconductor growth;Photoluminescence;Semiconducting silicon;Semiconductor doping;
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