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| Publications [#60742] of Martin A. Brooke
search ieeexplore.ieee.org.Papers Published
- Bergman, J.I. and Chang, J. and Joo, Y. and Matinpour, B. and Laskar, J. and Jokerst, N.M. and Brooke, M.A. and Brar, B. and Beam, E. III, RTD/CMOS nanoelectronic circuits: Thin-film InP-based resonant tunneling diodes integrated with CMOS circuits,
IEEE Electron Device Letters, vol. 20 no. 3
(1999),
pp. 119 - 122 [55.748907]
(last updated on 2007/04/11)
Abstract: The combination of resonant tunneling diodes (RTD's) and complementary metal-oxide-semiconductor (CMOS) silicon circuitry can offer substantial improvement in speed, power dissipation, and circuit complexity over CMOS-only circuits. We demonstrate the first integrated resonant tunneling CMOS circuit, a clocked 1-bit comparator with a device count of six, compared with 21 in a comparable all-CMOS design. A hybrid integration process is developed for InP-based RTD's which are transferred and bonded to CMOS chips. The prototype comparator shows sensitivity in excess of 106 V/A, and achieves error-free performance in functionality testing. An optimized integration process, under development, can yield high-speed, low power circuits by lowering the high parasitic capacitance associated with the prototype circuit.
Keywords: CMOS integrated circuits;Thin films;Semiconducting indium phosphide;Capacitance;Comparator circuits;
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