Publications [#67600] of Richard B. Fair

Papers Published

1. Fair, R.B., Recent advances in implantation and diffusion modeling for the design and process control of bipolar ICs, Electrochemical Society Spring Meeting (papers in extended summary form only received) (1977), pp. 598 - 600, Philadelphia, PA, USA
   (last updated on 2007/04/17)

   Abstract:
   The recent progress that has been made in simulating impurity doping profiles in silicon integrated circuits and understanding their influence on device performance has occurred as a result of improved process control and characterization as well as an expanded knowledge base of the physical processes influencing diffusion. It is the purpose of this paper to review the relevant physics of the diffusion of ion-implanted and chemically-diffused B, P, and As, and to show how these dopants can be treated quantitatively for the purpose of determining single-diffusant and multiple-component profiles. The usefulness of these calculations in identifying the important parameters which dominate process control and device parameter control is reviewed

   Keywords:
   bipolar integrated circuits;diffusion in solids;electronic engineering computing;ion implantation;process control;semiconductor doping;