Publications [#67619] of Richard B. Fair

Papers Published

1. Fair, Richard B., History of some early developments in ion-implantation technology leading to silicon transistor manufacturing, Proceedings of the IEEE, vol. 86 no. 1 (1998), pp. 111 - 137 [5.658764]
   (last updated on 2007/04/17)

   Abstract:
   Ion implantation of dopant impurities to form p-n junctions and other doped regions in silicon transistors has evolved from an experimental curiosity in solid-state physics to become a dominant technology in today's integrated circuit manufacturing. This paper traces the key inventions and early developments in ion beam doping concepts from the early 1950's through the 1970's as they were applied to the development of metal-oxide-semiconductor and bipolar transistors.

   Keywords:
   Integrated circuit manufacture;MOSFET devices;Bipolar transistors;Semiconducting silicon;Semiconductor doping;Semiconductor junctions;Impurities;Annealing;Gates (transistor);