Publications [#67722] of Richard B. Fair

Papers Published

1. Fair, R.B., Challenges and priorities for two dimensional process simulation, Proceedings - The Electrochemical Society, vol. 91 no. 4 (1991), pp. 689 - 702, Montreal, Que, Can
   (last updated on 2007/04/17)

   Abstract:
   Silicon technology requires two-dimensional process simulation. However the complexity of such simulation has increased rapidly with decreasing device dimensions. This paper addresses some of the challenges for two-dimensional process simulation, such as-what are the important problems that need to be solved before a simulator becomes useful? Who decides what these problems are? What are the barriers to accepting two-dimensional process simulators for use in process design and device design? Examples of problems will be presented where solutions are vital to the applications of process simulation to submicron technology. New attempts at two dimensional model verification will also be described.

   Keywords:
   Semiconducting Silicon;Heat Treatment - Annealing;