Publications [#264686] of Jungsang Kim

Papers Published

1. Jin, S; Mavoori, H; Kim, J; Aksyuk, VA, Control of microelectromechanical systems membrane curvature by silicon ion implantation, Applied Physics Letters, vol. 83 no. 12 (2003), pp. 2321-2323, AIP Publishing, ISSN 0003-6951 [1.1611639], [doi]
   (last updated on 2026/01/15)

   Abstract:
   A study was performed on control of microelectromechanical systems (MEMS) membrane curvature by silicon ion implantation. The Si+ ion implantations were applied at dose levels of 0.4-5×1016/cm 2 into the gold metallization layer to reduce the mirror curvature. It was found that the curvature change as well as the temperature dependence were dependent on the implantation dose.

   Keywords:
   elemental semiconductors;gold;integrated circuit metallisation;ion implantation;micro-optics;micromechanical devices;micromirrors;silicon;