Publications [#67635] of Richard B. Fair

Papers Published

1. Fair, R. B. and Cook, R. C. and Wortman, J. J., CURVE FITTING MODELS FOR BORON, PHOSPHORUS AND ARSENIC ION IMPLANTATIONS IN CRYSTALLINE SILICON., Electrochemical Society Extended Abstracts, vol. 85-1 (1985), pp. 371 - 372, Toronto, Ont, Can
   (last updated on 2007/04/17)

   Abstract:
   A curve-fitting model has been developed to calculate as-implanted profiles for As, B and P ions implanted into crystalline silicon. In general, good agreement was shown to exist between the calculated profiles and the experimental profiles for specific implantation conditions. The sum of the Gaussian distribution and exponential distribution describes the profiles reasonably well.

   Keywords:
   MATHEMATICAL TECHNIQUES - Curve Fitting;CRYSTALS;