Publications [#67788] of Jeffrey T. Glass

Papers Published

1. McClure, Michael T. and von Windheim, Josko A. and Glass, Jeffrey T. and Prater, John T., Effect of native SiO₂ layer on the nucleation of diamond using a combustion flame, Diamond and Related Materials, vol. 3 no. 3 (1994), pp. 239 - 244 [0925-9635(94)90086-8]
   (last updated on 2007/04/17)

   Abstract:
   The effect of native oxide thickness on the nucleation of diamond was investigated. The initial thickness of the native oxide on Si substrates was varied using three surface treatment methods: ultrasonic scratching, HF acid etching, and a combination of the two. The oxide layer was also modified during the experiment by using a low O₂:C₂H₂ ratio pregrowth treatment (R_f=0.93, d=15 mm). The use of HF acid eliminated the oxide layer within the detectable limits of the X-ray photoelectron spectroscopy analysis (about 3 Angstrom). A low gas ratio pregrowth treatment process (oxygen-to-acetylene ratio r_f, set to 0.93) meant that diamond crystals were formed after 30 s and a complete film in the center of the deposition area after 180s. The low gas ratio pregrowth treatment suppressed the formation of the oxide layer relative to standard growth conditions (R_f=0.97, d=10 mm). However, it was determined that despite this low gas ratio treatment SiO₂ formation was possible inside the acetylene feather.

   Keywords:
   Thin films;Surface treatment;Etching;Crystals;Crystal growth;