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| Publications [#64711] of Hisham Z. Massoud
Papers Published
- Irene, E.A. and Massoud, H.Z. and Tierney, E., Silicon oxidation studies: silicon orientation effects on thermal oxidation,
J. Electrochem. Soc. (USA), vol. 133 no. 6
(1986),
pp. 1253 - 6
(last updated on 2007/04/15)
Abstract: The initial stage of the thermal oxidation of various crystallographic orientations of silicon ((100), (110), and (111) orientations) reveals a complex rate behavior. This behavior is not understood within the conventional linear-parabolic model. A recently revised model which explicitly contains the areal density of Si atoms and mechanical stress effects is shown to provide both a qualitative (for all orientations studied) and somewhat quantitative (for (110) and (111) orientations) explanation of the complex substrate orientation effects
Keywords: crystal orientation;elemental semiconductors;oxidation;silicon;viscosity;
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