Publications [#64730] of Hisham Z. Massoud

Papers Published

1. Massoud, H.Z., Ellipsometry-based process monitoring and control for ultrathin gate dielectrics, Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (1997), pp. 208 - 16, Montreal, Que., Canada
   (last updated on 2007/04/15)

   Abstract:
   This paper describes the use of automated in situ real-time high-temperature ellipsometry in the monitoring of the growth of ultrathin dielectrics and its use in the temperature control of rapid-thermal processing oxidation equipment. The control process is based on oxide-thickness monitoring while executing temperature control and ending the oxide growth process when the desired thickness is reached. Results are presented in the growth of 10 nm thick oxides

   Keywords:
   dielectric thin films;ellipsometry;monitoring;oxidation;process control;rapid thermal processing;temperature control;thickness measurement;